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Question

Electronic Devices Question on Semiconductor electronics: materials, devices and simple circuits

In a silicon sample doped with N-type impurities, the Fermi level (EF)(E_F) is situated 0.35 eV away from the intrinsic Fermi level (Ei)(E_i). If the energy bandgap (Eg)(E_g) of silicon at 300 K is considered to be 1.10 eV, what is the separation between the Fermi level (EF)(E_F) and the valence band edge (Ev)(E_v)?

A

0.20 eV

B

0.30 eV

C

1.45 eV

D

0.90 eV

Answer

0.90 eV

Explanation

Solution

The Correct answer is option (D) : 0.90 eV